Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
  Pattern Generation - Emulsion - 10x
Feature geometry
Shape of feature with dimensions characterized by the minimum feature size
 equal line space
Magnification 10
Max aperture size
Size of pattern generator's maximum aperture (e.g., 1 mm)
 950.0 um
Max flash count
Maximum number of flashes allowed per mask.
 100000
Min aperture size
Size of pattern generator's minimum aperture (e.g., 2 um)
 2.0 um
Min feature size 2 µm
Equipment GCA 3600F PG
Equipment characteristics:
File formats
List of CAD file formats supported (eg. GDSII, CIF)
 cif
Mask coatings
Mask coating materials (eg. chrome).
 chromium, emulsion
Mask plate dimensions
Width, length, thickness of the mask plates (eg. 5x7x0.09 inch).
 5x5x.09 inch, 7x7x.09 inch
Mask polarity
Polarity of the mask.
 either
Max field size 150 mm
Comments:
  • Mask coating : Emulsion only.
  • Mask polarity: Clearfield only.
  • Mask dimensions: 5x5x0.090
    inches only.
  • Max field size: 105 mm.
  • Maximum allowable number of flashes per mask plate: 100000.