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Maskless lithography: Page 1 of 1

Process Hierarchy

  • Bonding
  • Clean
  • Consulting
  • Deposition
  • Doping
  • Etch
  • LIGA
  • Lift off
  • Lithography
  • Contact mask lithography
  • Maskless lithography
  • Miscellaneous lithography
  • Projection mask lithography
  • Mask making
  • Metrology
  • Miscellaneous
  • Packaging
  • Polishing
  • Process technologies
  • Thermal
  • Unique capabilities
  • DUV Lithography
  • Deep boron diffusion
  • Hot Embossing
  • LIGA
  • Maskless lithography
  • Microwave bonding
  • Shape memory alloy deposition
  • Silicon-germanium processes
  • Supercritical dry
  • Xenon difluoride etch
Maskless lithography
In this type of lithography a reconfigurable optical mirror array is used to project the image on the substrate to expose the photoresist. The process is a useful low-cost alternative to conventional contact lithography since no glass mask is needed.
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Process
Custom Laser write litho module
Direct laser write lithography (Automated)
Direct laser write lithography (Manual)
E-beam Lithography
Maskless photolithography (align/expose only)
Maskless photolithography (front-front align) (Rogers R/Flex 8080)
Maskless photolithography (front-front align) (Shipley 1827)
Maskless photolithography (front-front align) (Shipley 220)
Direct laser write
E-beam exposure (ebeam)
Maskless laser write
Maskless printing
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